Flux-trapping characterization for superconducting electronics using a cryogenic widefield N-V diamond microscope
Rohan T. Kapur, Pauli Kehayias, Sergey K. Tolpygo, Adam A. Libson, George Haldeman, Collin N. Muniz, Alex Wynn, Nathaniel J. O’Connor, Neel A. Parmar, Ryan Johnson, Andrew C. Maccabe, John Cummings, Justin L. Mallek, Danielle A. Braje, Jennifer M. Schloss
DOI 10.1103/3zcp-lsrd · Physical Review Applied
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Abstract
Magnetic flux trapping is a significant hurdle limiting the reliability and scalability of superconducting electronics, yet tools for imaging flux vortices remain slow or insensitive. We present a cryogenic widefield N-V diamond magnetic microscope capable of rapid, micrometer-scale imaging of flux trapping in superconducting devices. Using this technique, we measure vortex expulsion fields in Nb thin films and patterned strips, revealing a crossover in expulsion behavior between 10- and 20-μm strip widths. The observed scaling agrees with theoretical models and suggests the influence of film defects on vortex expulsion dynamics. This instrument enables high-throughput magnetic characterization of superconducting materials and circuits, providing new insight for flux mitigation strategies in scalable superconducting electronics.
Source-reported materials — not catalogue approval
| Formula | Reported Tc (K) | Pressure (GPa) | Type |
|---|---|---|---|
| Nb Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 9.2 | Pressure not reported | onset |
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