Annealing reduces Si3N4 microwave-frequency dielectric loss in superconducting resonators
S. Mittal, K. Adachi, N.E. Frattini, M.D. Urmey, S-X. Lin, A.L. Emser, C. Metzger, L.G. Talamo, S. Dickson, D. Carlson, S.B. Papp, C.A. Regal, K.W. Lehnert
DOI 10.1103/PhysRevApplied.21.054044 · Physical Review Applied
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Abstract
The dielectric loss of silicon nitride (Si3N4) limits the performance of microwave-frequency devices that rely on this material for sensing, signal processing, and quantum communication. Using superconducting resonant circuits, we measure the cryogenic loss tangent of either as-deposited or high-temperature annealed stoichiometric Si3N4 as a function of drive strength and temperature. The internal loss behavior of the electrical resonators is largely consistent with the standard tunneling model of two-level systems (TLSs), including damping caused by resonant energy exchange with TLSs and by the relaxation of nonresonant TLSs. We further supplement the TLS model with a self-heating effect to explain an increase in the loss observed in as-deposited films at large drive powers. Critically, we demonstrate that annealing remedies this anomalous power-induced loss, reduces the relaxation-type damping by more than 2 orders of magnitude, and reduces the resonant-type damping by a factor of 3. Employing infrared absorption spectroscopy, we find that annealing reduces the concentration of hydrogen in Si3N4, suggesting that hydrogen impurities cause substantial dissipation.
Source-reported materials — not catalogue approval
| Formula | Reported Tc (K) | Pressure (GPa) | Type |
|---|---|---|---|
| NbTiN Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 15 | Pressure not reported | unknown |
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