Andreev reflection in the fractional quantum Hall effect
Nancy P. Sandler, Claudio de C. Chamon, Eduardo Fradkin
DOI 10.1103/PhysRevB.57.12324 · Physical Review B
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Abstract
We study the reflection of electrons and quasiparticles on point-contact interfaces between fractional quantum Hall (FQH) states and normal metals (leads), as well as interfaces between two FQH states with mismatched filling fractions. We classify the processes taking place at the interface in the strong-coupling limit. In this regime a set of quasiparticles can decay into quasiholes on the FQH side and charge excitations on the other side of the junction. This process is analogous to an Andreev reflection in normal-metal/superconductor (N−S) interfaces.
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