Quantum Phase Diffusion in a Small Underdamped Josephson Junction
H. F. Yu, X. B. Zhu, Z. H. Peng, Ye Tian, D. J. Cui, G. H. Chen, D. N. Zheng, X. N. Jing, Li Lu, S. P. Zhao, Siyuan Han
DOI 10.1103/PhysRevLett.107.067004 · Physical Review Letters
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Abstract
Quantum phase diffusion in a small underdamped Nb/AlOx/Nb junction (∼0.4 μm2) is demonstrated in a wide temperature range of 25–140 mK where macroscopic quantum tunneling (MQT) is the dominant escape mechanism. We propose a two-step transition model to describe the switching process in which the escape rate out of the potential well and the transition rate from phase diffusion to the running state are considered. The transition rate extracted from the experimental switching current distribution follows the predicted Arrhenius law in the thermal regime but is greatly enhanced when MQT becomes dominant.
Source-reported materials — not catalogue approval
| Formula | Reported Tc (K) | Pressure (GPa) | Type |
|---|---|---|---|
| Nb Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | — | Pressure not reported | unknown |
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