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Nodal Order Parameter in Electron-Doped Pr2−xCexCuO4−δ Superconducting Films

A. Snezhko, R. Prozorov, D. D. Lawrie, R. W. Giannetta, J. Gauthier, J. Renaud, P. Fournier

DOI 10.1103/PhysRevLett.92.157005 · Physical Review Letters

T1

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Abstract

The London penetration depth, λab(T), is reported for thin films of the electron-doped superconductor Pr2−xCexCuO4−δ with varying Ce concentration, x=0.13, 0.15, and 0.17. Measurements down to 0.35 K were carried out using a tunnel-diode oscillator with excitation fields applied both perpendicular and parallel to the conducting planes. Films at all three doping levels exhibited power law behavior indicative of d-wave pairing with impurity scattering. These results are fully consistent with previous measurements on single crystals.

Source-reported materials — not catalogue approval

FormulaReported Tc (K)Pressure (GPa)Type
Pr2-xCexCuO4-δ

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9.1Pressure not reportedunknown
Pr2-xCexCuO4-δ

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Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula.

20.5Pressure not reportedunknown
Pr2-xCexCuO4-δ

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11.8Pressure not reportedunknown
V3Si

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—Pressure not reportedunknown

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