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Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process

Curtz, Noé, Koller, Edmond, Zbinden, Hugo, Decroux, Michel, Antognazza, Louis, Fischer, Øystein, Gisin, Nicolas

arXiv:1002.0808 · 2010-03-12

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Abstract

Manufacturing superconducting circuits out of ultrathin films is a challenging task when it comes to patterning complex compounds, which are likely to be deteriorated by the patterning process. With the purpose of developing high-T$_c$ superconducting photon detectors, we designed a novel route to pattern ultrathin YBCO films down to the nanometric scale. We believe that our method, based on a specific use of a focused-ion beam, consists in locally implanting Ga^{3+} ions and/or defects instead of etching the film. This protocol could be of interest to engineer high-T$_c$ superconducting devices (SQUIDS, SIS/SIN junctions and Josephson junctions), as well as to treat other sensitive compounds.

Source-reported materials — not catalogue approval

FormulaReported Tc (K)Pressure (GPa)Type
NbN

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2.6Pressure not reportedunknown
YBa2Cu3O7-δ

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92Pressure not reportedunknown
YBa2Cu3O7-δ

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80Pressure not reportedunknown
YBa2Cu3O7-δ

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72Pressure not reportedunknown
YBa2Cu3O7-δ

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70Pressure not reportedunknown
YBa2Cu3O7-δ

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Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula.

75Pressure not reportedunknown
YBa2Cu3O7-δ

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Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula.

70Pressure not reportedunknown
YBa2Cu3O7-δ

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Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula.

75Pressure not reportedunknown
YBa2Cu3O7-δ

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Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula.

65Pressure not reportedunknown

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