Coherent Josephson phase qubit with a single crystal silicon capacitor
U. Patel, Y. Gao, D. Hover, G. J. Ribeill, S. Sendelbach, R. McDermott
arXiv:1210.1545 · DOI 10.1063/1.4773996 · 2012-10-04 · arXiv: Superconductivity
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Abstract
We have incorporated a single crystal silicon shunt capacitor into a Josephson phase qubit. The capacitor is derived from a commercial silicon-on-insulator wafer. Bosch reactive ion etching is used to create a suspended silicon membrane; subsequent metallization on both sides is used to form the capacitor. The superior dielectric loss of the crystalline silicon leads to a significant increase in qubit energy relaxation times. T1 times up to 1.6 micro-second were measured, more than a factor of two greater than those seen in amorphous phase qubits. The design is readily scalable to larger integrated circuits incorporating multiple qubits and resonators.
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