Characterization and reduction of microfabrication-induced decoherence in superconducting quantum circuits

C. M. Quintana; A. Megrant; Z. Chen; A. Dunsworth; B. Chiaro; R. Barends; B. Campbell; Yu Chen; I. -C. Hoi; E. Jeffrey; J. Kelly; J. Y. Mutus; P. J. J. O'Malley; C. Neill; P. Roushan; D. Sank; A. Vainsencher; J. Wenner; T. C. White; A. N. Cleland; John M. Martinis

doi:10.1063/1.4893297

Characterization and reduction of microfabrication-induced decoherence in superconducting quantum circuits

C. M. Quintana, A. Megrant, Z. Chen, A. Dunsworth, B. Chiaro, R. Barends, B. Campbell, Yu Chen, I. -C. Hoi, E. Jeffrey, J. Kelly, J. Y. Mutus, P. J. J. O'Malley, C. Neill, P. Roushan, D. Sank, A. Vainsencher, J. Wenner, T. C. White, A. N. Cleland, John M. Martinis

arXiv:1407.4769 · DOI 10.1063/1.4893297 · 2014-07-17 · Applied Physics Letters

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Abstract

Many superconducting qubits are highly sensitive to dielectric loss, making the fabrication of coherent quantum circuits challenging. To elucidate this issue, we characterize the interfaces and surfaces of superconducting coplanar waveguide resonators and study the associated microwave loss. We show that contamination induced by traditional qubit lift-off processing is particularly detrimental to quality factors without proper substrate cleaning, while roughness plays at most a small role. Aggressive surface treatment is shown to damage the crystalline substrate and degrade resonator quality. We also introduce methods to characterize and remove ultra-thin resist residue, providing a way to quantify and minimize remnant sources of loss on device surfaces.