"Quick and dirty" technology for fabrication of a single BiSrCaCuO mesas

E. A. Vopilkin; A. V. Chiginev; L. S. Revin; A. N. Tropanova; I. Yu. Shuleshova; A. I. Okhapkin; A. D. Shovkun; A. B. Kulakov; A. L. Pankratov

doi:10.1088/0953-2048/28/4/045006

"Quick and dirty" technology for fabrication of a single BiSrCaCuO mesas

E. A. Vopilkin, A. V. Chiginev, L. S. Revin, A. N. Tropanova, I. Yu. Shuleshova, A. I. Okhapkin, A. D. Shovkun, A. B. Kulakov, A. L. Pankratov

arXiv:1409.3950 · DOI 10.1088/0953-2048/28/4/045006 · 2014-09-13 · Superconductor Science and Technology

T1theoretical9 citations

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Abstract

The technology of wet etching allowing fabrication of standalone BiSrCaCuO mesa structures was proposed. The produced mesas can be produced much thicker than ones usually being studied. The time required for the fabrication is much smaller in comparison with the standard method of ion milling. The process used is controllable which provides acceptable precision of mesa fabrication. The current-voltage characteristics of the sample showing Josephson nature were obtained. The qualitative comparison with characteristics of similar structures fabricated by other groups was carried out.

Source-reported materials — not catalogue approval

Formula	Reported Tc (K)	Pressure (GPa)	Type
Bi1.85Pb0.35Sr2CaCu2O8+x Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula.	90	Pressure not reported	unknown