Ambient Temperature Growth and Superconducting Properties of Ti-V Alloy Thin Films
Pandey, Shekhar Chandra, Sharma, Shilpam, Khandelwal, Ashish, Chattopadhyay, M. K.
arXiv:2308.02303 · 2023-08-07
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Abstract
A study on the optimization of ambient temperature growth and superconducting properties of Ti-V alloy thin films grown on SiO2-coated Si substrate is reported here. These films have been synthesized by co-sputtering of Ti and V targets, and films having different Ti concentrations were deposited to get the optimized critical temperature (TC) of thin films close to the bulk value. The maximum TC of 5.2 K has been obtained in the Ti40V60 composition, which is further increased to 6.2 K when a 10 nm thick Ti underlayer is added below the Ti-V film. GIXRD measurements confirm the formation of Ti-V alloys in the desired crystal structure. The upper critical field (HC2) of the thin films has been estimated with the help of magnetotransport measurements. The utility of Ti-V alloy thin films in superconducting radiation detection applications is ascertained.
Source-reported materials — not catalogue approval
| Formula | Reported Tc (K) | Pressure (GPa) | Type |
|---|---|---|---|
| Ti40V60 Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 5.2 | Pressure unresolved | unknown |
| Ti40V60 Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 6.2 | Pressure unresolved | unknown |
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