Magnetic penetration depth of Aluminum thin films

David López-Núñez; Alba Torras-Coloma; Queralt Portell Montserrat; Elia Bertoldo; Luca Cozzolino; Gemma Rius; M. Martínez; P. Forn-Díaz

doi:10.1088/1361-6668/adf360

Magnetic penetration depth of Aluminum thin films

David López-Núñez, Alba Torras-Coloma, Queralt Portell Montserrat, Elia Bertoldo, Luca Cozzolino, Gemma Rius, M. Martínez, P. Forn-Díaz

arXiv:2311.14119 · DOI 10.1088/1361-6668/adf360 · 2023-11-23 · Superconductor Science and Technology

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Abstract

We present a study of the superconducting penetration depth $λ$ in aluminum thin films of varying thickness. The range of thicknesses chosen spans from the thin-film regime to the regime approaching bulk behavior. The penetration depths observed range from $λ= 163.3\pm0.4~\rm{nm}$ for the thinnest $20~\rm{nm}$ samples down to $λ= 53.6\pm0.4~\rm{nm}$ for the $200~\rm{nm}$-thick ones. In order to accurately determine $λ$, we performed complementary measurements using the frequency of superconducting $LC$ resonators as well as the resistance of normal-state meanders. Both methods yield comparable results, providing a well-characterized set of values of $λ$ in aluminum in the relevant range for applications in fields such as quantum computing and microwave radiation detector technologies.

Source-reported materials — not catalogue approval

Formula	Reported Tc (K)	Pressure (GPa)	Type
Al Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula.	1.2	Pressure not reported	midpoint