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Electronic conduction and superconducting properties of CoSi$_2$ films on silicon--an unconventional superconductor with technological potential

Shao-Pin Chiu, Chang-Jan Wang, Yi-Chun Lin, Shun-Tast Tu, Shouray Sahu, Ruey-Tay Wang, Chih-Yuan Wu, Sheng-Shiuan Yeh, Stefan Kirchner, Juhn-Jong Lin

arXiv:2401.17601 · DOI 10.1016/j.cjph.2024.04.018 · 2024-01-31

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Abstract

We report observations of unusual normal-state electronic conduction properties and superconducting characteristics of high-quality CoSi$_2$/Si films grown on silicon Si(100) and Si(111) substrates. A good understanding of these features shall help to address the underlying physics of the unconventional pairing symmetry recently observed in transparent CoSi$_2$/TiSi$_2$ heterojunctions [S. P. Chiu \textit{et al.}, Sci. Adv. \textbf{7}, eabg6569 (2021); Nanoscale \textbf{15}, 9179 (2023)], where CoSi$_2$/Si is a superconductor with a superconducting transition temperature $T_c \simeq$ (1.1--1.5) K, dependent on its dimensions, and TiSi$_2$ is a normal metal. In CoSi$_2$/Si films, we find a pronounced positive magnetoresistance caused by the weak-antilocalization effect, indicating a strong Rashba spin-orbit coupling (SOC). This SOC generates two-component superconductivity in CoSi$_2$/TiSi$_2$ heterojunctions. The CoSi$_2$/Si films are stable under ambient conditions and have ultralow 1/$f$ noise. Moreover, they can be patterned via the standard lithography techniques, which might be of considerable practical value for future scalable superconducting and quantum device fabrication.

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FormulaReported Tc (K)Pressure (GPa)Type
CoSi2

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1.3Pressure unresolvedunknown

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