On the Path to High-temperature Josephson Multi-junction Devices

Xu Wang; Fucong Chen; Zefeng Lin; Changhong Yuan; Shibing Tian; Chunguang Li; Victor Kornev; Nikolay Kolotinskiy

doi:10.23919/emsci.2024.0009

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On the Path to High-temperature Josephson Multi-junction Devices

Xu Wang, Fucong Chen, Zefeng Lin, Changhong Yuan, Shibing Tian, Chunguang Li, Victor Kornev, Nikolay Kolotinskiy

arXiv:2404.12767 · DOI 10.23919/emsci.2024.0009 · 2024-04-19 · Electromagnetic Science

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Abstract

We report our progress in the high-temperature superconductor (HTS) Josephson junction fabrication process founded on using a focused helium ion beam damaging technique and discuss the expected device performance attainable with the HTS multi-junction device technology. Both the achievable high value of characteristic voltage $V_c=I_cR_N$ of Josephson junctions and the ability to design a large number of arbitrary located Josephson junctions allow narrowing the existing gap in design abilities for LTS and HTS circuits even with using a single YBCO film layer. A one-layer topology of active electrically small antenna is suggested and its voltage response characteristics are considered.