Vortex Motion Induced Losses in Tantalum Resonators
Faranak Bahrami, Matthew P. Bland, Nana Shumiya, Ray D. Chang, Elizabeth Hedrick, Russell A. McLellan, Kevin D. Crowley, Aveek Dutta, Logan Bishop-Van Horn, Yusuke Iguchi, Aswin Kumar Anbalagan, Guangming Cheng, Chen Yang, Nan Yao, Andrew L. Walter, Andi M. Barbour, Sarang Gopalakrishnan, Robert J. Cava, Andrew A. Houck, Nathalie P. de Leon
arXiv:2503.03168 · 2025-03-05
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Abstract
Tantalum (Ta) based superconducting circuits have been demonstrated to enable record qubit coherence times and quality factors, motivating a careful study of the microscopic origin of the remaining losses that limit their performance. We have recently shown that the losses in Ta-based resonators are dominated by two-level systems (TLSs) at low microwave powers and millikelvin temperatures. We also observe that some devices exhibit loss that is exponentially activated at a lower temperature inconsistent with the superconducting critical temperature (Tc) of the constituent film. Specifically, dc resistivity measurements show a Tc of over 4 K, while microwave measurements of resonators fabricated from these films show losses that increase exponentially with temperature with an activation energy as low as 0.3 K. Here, we present a comparative study of the structural and thermodynamic properties of Ta-based resonators and identify vortex motion-induced loss as the source of thermally activated microwave loss. Through careful magnetoresistance and x-ray diffraction measurements, we observe that the increased loss occurs for films that are in the clean limit, where the superconducting coherence length is shorter than the mean free path. Vortex motion-induced losses are suppressed for films in the dirty limit, which show evidence of structural defects that can pin vortices. We verify this hypothesis by explicitly pinning vortices via patterning and find that we can suppress the loss by microfabrication.
Source-reported materials — not catalogue approval
| Formula | Reported Tc (K) | Pressure (GPa) | Type |
|---|---|---|---|
| Ta Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 0.7 | Pressure not reported | unknown |
| Ta Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 4.3 | Pressure not reported | unknown |
| Ta Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 4.33 | Pressure not reported | zero_resistance |
| Ta Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 4.39 | Pressure not reported | zero_resistance |
| Ta Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 4.33 | Pressure not reported | zero_resistance |
| Ta Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 4.28 | Pressure not reported | zero_resistance |
| Ta Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 4.3 | Pressure not reported | zero_resistance |
| Ta Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 4.22 | Pressure not reported | zero_resistance |
| Ta Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 4.22 | Pressure not reported | zero_resistance |
| Ta Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 4.33 | Pressure not reported | zero_resistance |
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