Flux-flow resistivity anisotropy in the instability regime in the a-b plane of epitaxial YBCO thin films
B. Kalisky, P. Aronov, G. Koren, A. Shaulov, Y. Yeshurun, R. P. Huebener
arXiv:cond-mat/0606667 · DOI 10.1103/PhysRevLett.97.067003 · 2006-06-26 · Physical review letters
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Abstract
Measurements of the nonlinear flux-flow resistivity $ρ$ and the critical vortex velocity $\rm v^*_φ$ at high voltage bias close to the instability regime predicted by Larkin and Ovchinnikov \cite{LO} are reported along the node and antinode directions of the d-wave order parameter in the \textit{a-b} plane of epitaxial $YBa_2Cu_3O_{7-δ}$ films. In this pinning-free regime, $ρ$ and $\rm v^*_φ$ are found to be anisotropic with values in the node direction larger on average by 10% than in the antinode direction. The anisotropy of $ρ$ is almost independent of temperature and field. We attribute the observed results to the anisotropic quasiparticle distribution on the Fermi surface of $YBa_2Cu_3O_{7-δ}$.
Source-reported materials — not catalogue approval
| Formula | Reported Tc (K) | Pressure (GPa) | Type |
|---|---|---|---|
| YBa2Cu3O7-δ Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 94 | Pressure unresolved | onset |
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