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Comparison of Power Dependence of Microwave Surface Resistance of Unpatterned and Patterned YBCO Thin Film

H. Xin, D. E. Oates, A. C. Anderson, R. L. Slattery, G. Dresselhaus, M. S. Dresselhaus

arXiv:cond-mat/9906044 · DOI 10.1109/22.853465 · 1999-06-03 · IEEE Transactions on Microwave Theory and Techniques

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Abstract

The effect of the patterning process on the nonlinearity of the microwave surface resistance $R_S$ of YBCO thin films is investigated. With the use of a sapphire dielectric resonator and a stripline resonator, the microwave $R_S$ of YBCO thin films was measured before and after the patterning process, as a function of temperature and the rf peak magnetic field in the film. The microwave loss was also modeled, assuming a $J_{rf}^2$ dependence of $Z_S(J_{rf})$ on current density $J_{rf}$. Experimental and modeled results show that the patterning has no observable effect on the microwave residual $R_S$ or on the power dependence of $R_S$.

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FormulaReported Tc (K)Pressure (GPa)Type
YBa2Cu3O7

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—Pressure not reportedunknown

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