Tc max
5.0 K
Tc ambient
3.5 K
arXiv year
2001
Papers
17
Tc exp.
5.0 K
Tc theo.
—
Evidence
experimental
Tc max measured at thin_film, resistivity, DOI: 10.1103/PhysRevB.101.060508, confirmed by 2 papers
Evidence (20 records from 17 papers)
the flat columns above are aggregates — each line here is one paper's claim| Tc (K) | P (GPa) | Sample | Method | Pairing | Year | Tier | Paper |
|---|---|---|---|---|---|---|---|
| 5.0 | — | thin_film | resistivity, susceptibility | — | 2001 | T1 | DOI: 10.1103/PhysRevLett.87.197004 |
| 5.0 | — | thin_film | resistivity | — | 2020 | T1 | DOI: 10.1103/PhysRevB.101.060508 |
| 4.0 |
Structure
- Crystal structure
- amorphous
Superconducting parameters
- λ_eph (e–ph coupling)
- —
Samples & pressure
- Sample form
- thin_film
- Substrate
- SiO2/Si