Tc max
5.0 K
Tc ambient
3.5 K
arXiv year
2001
Papers
16
Tc exp.
5.0 K
Tc theo.
—
Evidence
experimental
Tc max measured at thin_film, resistivity, DOI: 10.1103/PhysRevB.101.060508, confirmed by 2 papers
Evidence (19 records from 16 papers)
the flat columns above are aggregates — each line here is one paper's claim| Tc (K) | P (GPa) | Sample | Method | Pairing | Year | Tier | Paper |
|---|---|---|---|---|---|---|---|
| 5.0 | — | thin_film | resistivity, susceptibility | — | 2001 | T1 | DOI: 10.1103/PhysRevLett.87.197004 |
| 5.0 | — | thin_film | resistivity | — | 2020 | T1 | DOI: 10.1103/PhysRevB.101.060508 |
| 4.0 | — | thin_film | — | — | 2016 | T1 | 1606.09406 |
| 3.9 | — | thin_film | resistivity | — | 2018 | T1 | DOI: 10.1103/PhysRevB.97.174502 |
| 3.5 | — | thin_film | — | — | 2019 | T1 | 1904.08596 |
| 3.5 | — | thin_film | resistivity | — | 2019 | T1 | DOI: 10.1103/PhysRevB.100.054520 |
| 3.5 | — | thin_film | — | — | 2016 | T1 | 1606.09406 |
| 3.4 | — | thin_film | resistivity | — | 2018 | T1 | DOI: 10.1103/PhysRevB.97.174502 |
| 3.4 | — | thin_film | resistivity | — | 2020 | T1 | DOI: 10.1103/PhysRevB.101.060508 |
| 3.4 | ambient | thin_film | resistivity | — | 2019 | T1 | 1903.10461 |
| 3.4 | — | thin_film | — | — | 2014 | T1 | 1406.1810 |
| 1.7 | — | thin_film | — | — | 2025 | T1 | DOI: 10.1103/4hb6-f6jl |
| — | — | thin_film | resistivity | — | 2025 | T1 | 2509.23404 |
| — | — | thin_film | — | — | 2023 | T3 | 2307.13575 |
| — | — | thin_film | — | — | 2022 | T1 | DOI: 10.1103/PhysRevD.106.112005 |
| — | — | thin_film | — | — | 2021 | T3 | 2112.04705 |
| — | — | thin_film | resistivity | — | 2020 | — | 1909.02915 |
| — | — | thin_film | resistivity | — | 2017 | T1 | 1712.05019 |
| — | — | thin_film | resistivity | — | 2016 | T1 | DOI: 10.1103/PhysRevB.93.094518 |
Structure
- Crystal structure
- amorphous
Superconducting parameters
- λ_eph (e–ph coupling)
- —
Samples & pressure
- Sample form
- thin_film
- Substrate
- SiO2/Si