Electron localization and superconducting fluctuations in quasi-two-dimensional Ti films
J. Vangrunderbeek, C. Van Haesendonck, Y. Bruynseraede
DOI 10.1103/PhysRevB.40.7594 · Physical Review B
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Abstract
Detailed measurements of the low-temperature variation of the resistance as a function of temperature and magnetic field are reported for sputtered Ti films with a thickness ranging from 8 to 100 nm. At low temperatures, the films showed a quasi-two-dimensional electronic behavior which can be described in terms of disorder-enhanced electron-electron interaction and weak electron localization in the presence of spin-orbit and magnetic scattering. Below 4.2 K, the inelastic scattering is dominated by the electron-electron interaction. Superconducting fluctuations are clearly observed in the thicker films and the extrapolated Tc decreases rapidly with increasing film resistivity. This is in agreement with a disorder-induced broadening of the density-of-states peak near the Fermi level. For the thicker films, the presence of a Kondo effect also has to be invoked to explain the temperature dependence of the resistance.
Source-reported materials — not catalogue approval
| Formula | Reported Tc (K) | Pressure (GPa) | Type |
|---|---|---|---|
| Ti Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 0.4 | Pressure not reported | unknown |
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