Development of Nb-GaAs based superconductor-semiconductor hybrid platform by combining in situ dc magnetron sputtering and molecular beam epitaxy
Clemens Todt, Sjoerd Telkamp, Filip Krizek, Christian Reichl, Mihai Gabureac, Rüdiger Schott, Erik Cheah, Peng Zeng, Thomas Weber, Arnold Müller, Christof Vockenhuber, Mohsen Bahrami Panah, Werner Wegscheider
DOI 10.1103/PhysRevMaterials.7.076201 · Physical Review Materials
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Abstract
We present Nb thin films deposited in situ on GaAs by combining molecular beam epitaxy and magnetron sputtering within an ultrahigh vacuum cluster. Nb films deposited at varying power, and a reference film from a commercial system, are compared. The results show clear variation between the in situ and ex situ deposition which we relate to differences in magnetron sputtering conditions and chamber geometry. The Nb films have critical temperatures of around 9K and critical perpendicular magnetic fields of up to Bc2=1.4T at 4.2K. From STEM images of the GaAs-Nb interface we find the formation of an amorphous interlayer between the GaAs and the Nb for both the ex situ and in situ deposited material.
Source-reported materials — not catalogue approval
| Formula | Reported Tc (K) | Pressure (GPa) | Type |
|---|---|---|---|
| Nb Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 9 | Pressure not reported | unknown |
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