Sputtering Current Driven Growth & Transport Characteristics of Superconducting Ti40V60 Alloy Thin Films
Shekhar Chandra Pandey, Shilpam Sharma, K. K. Pandey, Pooja Gupta, Sanjay Rai, Rashmi Singh, M. K. Chattopadhyay
arXiv:2501.00812 · 2025-01-01
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Abstract
The room temperature growth, characterization, and electrical transport properties of magnetron sputtered superconducting Ti40V60 alloy thin films are presented. The films exhibit low surface roughness and tunable transport properties. As the sputtering current increases, the superconducting transition move towards higher temperatures. Rietveld refinement of two dimensional XRD (2D XRD) pattern reveals the presence of stress in the films, which shifts from tensile to compressive as the sputtering current increases. Additionally, the crystallite size of the films increases with higher sputtering currents. The films exhibit a strong preferential orientation, contributing to their texturing. The crystallite size and texturing are found to be correlated with the superconducting transition temperature (TC) of the films. As the crystallite size and texturing increase, the TC of the films also rises.
Source-reported materials — not catalogue approval
| Formula | Reported Tc (K) | Pressure (GPa) | Type |
|---|---|---|---|
| Ti40V60 Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | — | Pressure not reported | unknown |
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