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Low-temperature transition to a superconducting phase in boron-doped silicon films grown on (001)-oriented silicon wafers

C. Marcenat, J. Kačmarčík, R. Piquerel, P. Achatz, G. Prudon, C. Dubois, B. Gautier, J. C. Dupuy, E. Bustarret, L. Ortega, T. Klein, J. Boulmer, T. Kociniewski, D. Débarre

DOI 10.1103/PhysRevB.81.020501 · Physical Review B

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Abstract

We report on a detailed analysis of the superconducting properties of boron-doped silicon films grown along the 001 direction by gas immersion laser doping. The doping concentration cB has been varied up to ∼10 at. % by increasing the number of laser shots to 500. No superconductivity could be observed down to 40 mK for doping level below ∼2 at. %. The critical temperature Tc then increased steeply to reach ∼0.6 K for cB∼8 at. %. No hysteresis was found for the transitions in magnetic field, which is characteristic of a type II superconductor. The corresponding upper critical field μoHc2(0) was on the order of 1000 G, much smaller than the value previously reported by Bustarret et al. [E. Bustarret et al., Nature (London) 444, 465 (2006)].

Source-reported materials — not catalogue approval

FormulaReported Tc (K)Pressure (GPa)Type
Si:B

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0.6Pressure not reportedonset
Si:B

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0.6Pressure not reportedonset
MgB2

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40Pressure not reportedunknown

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