Sub-μm Josephson Junctions for Superconducting Quantum Devices
J. M. Meckbach, M. Merker, S. J. Buehler, K. Ilin, B. Neumeier, U. Kienzle, E. Goldobin, R. Kleiner, D. Koelle, M. Siegel
arXiv:1210.1012 · DOI 10.1109/TASC.2012.2231719 · 2012-10-03 · IEEE Transactions on Applied Superconductivity
Active bibliographic source — not scientific approval
Bibliographic access preserves source history; it does not approve extracted materials or validate reported claims. Review warnings on each occurrence separately.
Abstract
For high-performance superconducting quantum devices based on Josephson junctions (JJs) decreasing lateral sizes is of great importance. Fabrication of sub-μm JJs is challenging due to non-flat surfaces with step heights of up to several 100 nm generated during the fabrication process. We have refined a fabrication process with significantly decreased film thicknesses, resulting in almost flat surfaces at intermediate steps during the JJ definition. In combination with a mix-&-match process, combining electron-beam lithography (EBL) and conventional photolithography, we can fabricate JJs with lateral dimensions down to 0.023 μm^2. We propose this refined process as an alternative to the commonly used chemical-mechanical polishing (CMP) procedure. We present transport measurements of JJs at 4.2 K that yield critical-current densities in the range from 50 to 10^4 A/cm^2. Our JJ process yields excellent quality parameters, Rsg/Rn up to ~50 and Vgap up to 2.81 mV, and also allows the fabrication of high-quality sub-μm wide long JJs (LJJs) for the study of Josephson vortex behavior. The developed technique can also be used for similar multilayer processes and is very promising for fabricating sub-μm JJs for quantum devices such as SQUIDs, qubits and SIS mixers.
Similar papers
Transport and Noise Properties of sub-100-nm Planar Nb Josephson Junctions with Metallic Hf-Ti Barriers for nano-SQUID Applications
similarity 0.89V. Morosh et al.
Source status unknown — claims are unverified
High Density Fabrication Process for Single Flux Quantum Circuits
similarity 0.89D. Yohannes et al. · 2023 · arXiv:2305.07607
Source status unknown — claims are unverified
Developments Toward a 250-nm, Fully Planarized Fabrication Process With Ten Superconducting Layers And Self-Shunted Josephson Junctions
similarity 0.88Sergey K. Tolpygo et al. · 2017 · arXiv:1704.07683
Source status unknown — claims are unverified
Side-wall spacer passivated sub-um Josephson junction fabrication process
similarity 0.88Leif Grönberg et al. · 2017 · arXiv:1706.06397
Source status unknown — claims are unverified
Planar Josephson junction devices with narrow superconducting strips: Topological properties and optimization
similarity 0.88Purna P. Paudel et al.
Source status unknown — claims are unverified
Advances in Josephson Junction Materials and Processes Toward Practical Quantum Computing
similarity 0.88Hyunseong Kim et al. · 2025 · arXiv:2505.12724
Source status unknown — claims are unverified