Effect of substrate temperature on the growth of Nb3Sn film on Nb by multilayer sputtering
Md Nizam Sayeed, Uttar Pudasaini, Charles E. Reece, Grigory V. Eremeev, Hani E. Elsayed-Ali
arXiv:2109.07066 · DOI 10.1016/j.tsf.2022.139569 · 2021-09-15 · Thin Solid Films
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Abstract
Nb3Sn films were fabricated by multilayer sequential sputtering on Nb at substrate temperatures ranging from room temperature to 250 °C. The multilayers were then annealed inside a separate vacuum furnace at 950 °C for 3h. The films material properties were characterized by X-ray diffraction, scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and transmission electron microscopy. The films superconducting properties were studied by four-point probe resistivity measurements from room temperature to below the superconducting critical temperature Tc. The highest film Tc was 17.76 K, obtained when the multilayers were deposited at room temperature. A superconducting Nb3Sn thin film with a smoother surface morphology but a lower Tc of 17.58 K was obtained on the film deposited at a substrate temperature of 250 °C.
Source-reported materials — not catalogue approval
| Formula | Reported Tc (K) | Pressure (GPa) | Type |
|---|---|---|---|
| Nb3Sn Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 17.76 | Pressure not reported | unknown |
| Nb3Sn Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 17.58 | Pressure not reported | unknown |
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