Structure determination of the Si(111)−7×3−In atomic-layer superconductor
Tetsuroh Shirasawa, Shunsuke Yoshizawa, Toshio Takahashi, Takashi Uchihashi
DOI 10.1103/PhysRevB.99.100502 · Physical Review B
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Abstract
The atomic structure of a superconducting atomic sheet of indium grown on Si(111) surface, i.e., In/Si(111)−7×3, is determined by using surface x-ray diffraction (SXRD) and low-energy electron diffraction (LEED). The structure consists of double layers of In atoms with a rectangular arrangement, verifying a theoretical prediction [J. W. Park and M. H. Kang, Phys. Rev. Lett. 109, 166102 (2012)]. For the so-called hexagonal phase, which has been considered to be a different 7×3 structure and to undergo a transition to the 7×7 structure below 265 K, LEED data indicate that the structural basis is 7×7 even at room temperature. The SXRD data are well reproduced by single-layer In with the In coverage of 10/7 In atoms per Si surface atom, proposed by a theory [J. W. Park and M. H. Kang, Phys. Rev. Lett. 117, 116102 (2016)].
Source-reported materials — not catalogue approval
| Formula | Reported Tc (K) | Pressure (GPa) | Type |
|---|---|---|---|
| In Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 2.8 | Pressure not reported | unknown |
| In Archive — visibility unverified Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula. | 2.4 | Pressure not reported | unknown |
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