← Back to search

Structure determination of the Si(111)−7×3−In atomic-layer superconductor

Tetsuroh Shirasawa, Shunsuke Yoshizawa, Toshio Takahashi, Takashi Uchihashi

DOI 10.1103/PhysRevB.99.100502 · Physical Review B

T1

Active bibliographic source — not scientific approval

Bibliographic access preserves source history; it does not approve extracted materials or validate reported claims. Review warnings on each occurrence separately.

Abstract

The atomic structure of a superconducting atomic sheet of indium grown on Si(111) surface, i.e., In/Si(111)−7×3, is determined by using surface x-ray diffraction (SXRD) and low-energy electron diffraction (LEED). The structure consists of double layers of In atoms with a rectangular arrangement, verifying a theoretical prediction [J. W. Park and M. H. Kang, Phys. Rev. Lett. 109, 166102 (2012)]. For the so-called hexagonal phase, which has been considered to be a different 7×3 structure and to undergo a transition to the 7×7 structure below 265 K, LEED data indicate that the structural basis is 7×7 even at room temperature. The SXRD data are well reproduced by single-layer In with the In coverage of 10/7 In atoms per Si surface atom, proposed by a theory [J. W. Park and M. H. Kang, Phys. Rev. Lett. 117, 116102 (2016)].

Source-reported materials — not catalogue approval

FormulaReported Tc (K)Pressure (GPa)Type
In

Archive — visibility unverified

Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula.

2.8Pressure not reportedunknown
In

Archive — visibility unverified

Source-occurrence policy only; no material identity or catalogue acceptance is inferred from the formula.

2.4Pressure not reportedunknown

Similar papers